SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Metrology, Inspection, and Process Control for Microlithography XVIII - Total measurement uncertainty and total process precision evaluation of a structural metrology approach to monitoring post-CMP processes
Lu, Wei, Silver, Richard M., Archie, Charles N., Stone, Stacey, Kang, Hyoung H., Chitturi, Prasanna R.Volume:
5375
Year:
2004
Language:
english
DOI:
10.1117/12.538051
File:
PDF, 596 KB
english, 2004