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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Photomask quality assessment solution for 90-nm technology node
Ohira, Katsumi, Tanabe, Hiroyoshi, Chung, Dong Hoon P., Nobuyuki, Yoshioka, Tateno, Motonari, Matsumura, Kenichi, Chen, Jiunn-Hung, Luk-Pat, Gerard T., Fukui, Norio, Tanaka, YoshioVolume:
5446
Year:
2004
Language:
english
DOI:
10.1117/12.557734
File:
PDF, 482 KB
english, 2004