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SPIE Proceedings [SPIE Process Module Metrology, Control and Clustering - San Jose, United States (Wednesday 11 September 1991)] Process Module Metrology, Control and Clustering - Open-loop predictive control of plasma etching of tungsten using an in-situ film thickness sensor
Stefani, Jerry A., Brankner, Keith J., Jucha, Rhett B., Pu, William T., Graas, Mark A., Davis, Cecil J., Herman, Irving P., Turner, Terry R.Volume:
1594
Year:
1992
Language:
english
DOI:
10.1117/12.56638
File:
PDF, 1.33 MB
english, 1992