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SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 13 September 2004)] 24th Annual BACUS Symposium on Photomask Technology - The influence of an electrostatic pin chuck on EUV mask flatness
Dicks, Gerald A., Staud, Wolfgang, Weed, J. Tracy, Mikkelson, Andrew R., Engelstad, Roxann L.Volume:
5567
Year:
2004
Language:
english
DOI:
10.1117/12.569034
File:
PDF, 666 KB
english, 2004