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SPIE Proceedings [SPIE Photonics Asia 2004 - Beijing, China (Monday 8 November 2004)] MEMS/MOEMS Technologies and Applications II - Extraction of exposure modeling parameters of thick resist
Liu, Chi, Ma, Zhichun, Jin, Guofan, Du, Jinglei, Liu, Shijie, Chen, Xuyuan, Duan, Xi, Luo, Boliang, Zhu, Jianhua, Guo, Yongkang, Du, ChunleiVolume:
5641
Year:
2004
Language:
english
DOI:
10.1117/12.571891
File:
PDF, 254 KB
english, 2004