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SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Advances in Resist Technology and Processing IX - Comparative study of deep-UV resist processes for 0.35-μm technology
Vinet, Francoise, Mourier, Thierry, Joubert, Olivier P., Heitzmann, Michel, Le Cornec, Charles, Pons, Michel J., Thackeray, James W., Orsula, George W., Novembre, Anthony E.Volume:
1672
Year:
1992
Language:
english
DOI:
10.1117/12.59746
File:
PDF, 585 KB
english, 1992