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SPIE Proceedings [SPIE Micro - DL Tentative - San Jose, CA (Sunday 1 March 1992)] Advances in Resist Technology and Processing IX - Lithographic evaluation and characterization of a negative deep-UV resist system for the next generation of DRAMs
Suh, Doowon, Palmer, Shane R., Chatterjee, Subhankar, Merrem, Hans-Joachim, Haltom, Robert C., Novembre, Anthony E.Volume:
1672
Year:
1992
Language:
english
DOI:
10.1117/12.59758
File:
PDF, 334 KB
english, 1992