![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE Microlithography 2005 - San Jose, CA (Sunday 27 February 2005)] Advances in Resist Technology and Processing XXII - Overcoming pattern collapse of ultra high resolution dense lines obtained with EUV resists
Jouve, A., Sturtevant, John L., Simon, J., Foucher, J., David, T., Tortai, J.-H., Solak, HarunVolume:
5753
Year:
2005
Language:
english
DOI:
10.1117/12.598763
File:
PDF, 1.73 MB
english, 2005