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SPIE Proceedings [SPIE SPIE Proceedings - (Sunday 12 February 2012)] - SiCN and Ta/TaN barriers for Cu/ultralow-k integration in 0.13´m technology
Yang, L. Y., Zhang, D. H., Li, C. Y., Lu, Peiwei, Foo, P. D., Chu, Junhao, Lai, Zongsheng, Wang, Lianwei, Xu, ShaohuiYear:
2012
Language:
english
DOI:
10.1117/12.608171
File:
PDF, 416 KB
english, 2012