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SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XII - Yokohama, Japan (Wednesday 13 April 2005)] Photomask and Next-Generation Lithography Mask Technology XII - Feasibility study of double exposure lithography for 65nm and 45nm node
Hsu, Stephen, Komuro, Masanori, Van Den Broeke, Douglas, Chen, J. F., Park, Jungchul, Hsu, Michael C. W.Volume:
5853
Year:
2005
Language:
english
DOI:
10.1117/12.617451
File:
PDF, 602 KB
english, 2005