SPIE Proceedings [SPIE Photomask Technology 2005 -...

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SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Impact of mask CD error on OPC performance for 65nm technology M1 level

Park, Oseo, Weed, J. Tracy, Martin, Patrick M., Oberschmidt, James, Li, Wai-Kin
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Volume:
5992
Year:
2005
Language:
english
DOI:
10.1117/12.630758
File:
PDF, 296 KB
english, 2005
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