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SPIE Proceedings [SPIE Photomask Technology 2005 - Monterey, California (Monday 3 October 2005)] 25th Annual BACUS Symposium on Photomask Technology - Application of the unified mask data format based on OASIS for VSB EB writers
Suzuki, Toshio, Weed, J. Tracy, Martin, Patrick M., Hirumi, Junji, Suga, OsamuVolume:
5992
Year:
2005
Language:
english
DOI:
10.1117/12.638800
File:
PDF, 404 KB
english, 2005