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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Parameter investigation of PEB sensitivity
Oh, Seung Keun, Lin, Qinghuang, Son, Eun Kyung, Park, Chan Sik, Lee, Jung Youl, Kim, Jeong Woo, Lee, Jae Woo, Kim, Deog Bae, Kim, Jaehyun, Lee, Geunsu, Moon, Seung-ChanVolume:
6153
Year:
2006
Language:
english
DOI:
10.1117/12.655449
File:
PDF, 95 KB
english, 2006