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SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Advances in Resist Technology and Processing XXIII - Effect of top coat and resist thickness on line-edge roughness
Singh, Lovejeet, Lin, Qinghuang, Matthew, Itty, Pawloski, Adam, Minvielle, AnnaVolume:
6153
Year:
2006
Language:
english
DOI:
10.1117/12.655925
File:
PDF, 752 KB
english, 2006