![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Emerging Lithographic Technologies X - Tri-layer resist process for fabricating sub 45-nm L&S patterns by EPL
Koba, Fumihiro, Lercel, Michael J., Matsumaro, Kazuyuki, Soda, Eiichi, Watanabe, Tadayoshi, Matsubara, Yoshihisa, Arimoto, Hiroshi, Matsumiya, Tasuku, Kawana, Daisuke, Yamashita, Naoki, Fujii, YasushiVolume:
6151
Year:
2006
Language:
english
DOI:
10.1117/12.655976
File:
PDF, 1.17 MB
english, 2006