![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Metrology, Inspection, and Process Control for Microlithography XX - New OPC verification method using die-to-database inspection
Yang, Hyunjo, Archie, Chas N., Choi, Jaeseung, Cho, Byungug, Hong, Jongkyun, Song, Jookyoung, Yim, Donggyu, Kim, Jinwoong, Yamamoto, MasahiroVolume:
6152
Year:
2006
Language:
english
DOI:
10.1117/12.656857
File:
PDF, 1.83 MB
english, 2006