SPIE Proceedings [SPIE SPIE 31st International Symposium on Advanced Lithography - San Jose, CA (Sunday 19 February 2006)] Design and Process Integration for Microelectronic Manufacturing IV - Challenges and solutions for trench lithography beyond 65nm node
Lu, Zhijian, Wong, Alfred K. K., Singh, Vivek K., Ho, Chi-Chien, Mason, Mark, Anderson, Andrew, Mckee, Randy, Jackson, Ricky, Zhu, Cynthia, Terry, MarkVolume:
6156
Year:
2006
Language:
english
DOI:
10.1117/12.659242
File:
PDF, 306 KB
english, 2006