SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XIII - Yokohama, Japan (Tuesday 18 April 2006)] Photomask and Next-Generation Lithography Mask Technology XIII - Electron beam lithography time dependent dose correction for reticle CD uniformity enhancement
Wilcox, Nathan, Hoga, Morihisa, Vernon, Matt, Jamieson, AndrewVolume:
6283
Year:
2006
Language:
english
DOI:
10.1117/12.681734
File:
PDF, 235 KB
english, 2006