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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - High-index fluoride materials for 193-nm immersion lithography
Nawata, Teruhiko, Flagello, Donis G., Inui, Yoji, Masada, Isao, Nishijima, Eiichi, Mabuchi, Toshiro, Mochizuki, Naoto, Satoh, Hiroki, Fukuda, TsuguoVolume:
6520
Year:
2007
Language:
english
DOI:
10.1117/12.711045
File:
PDF, 642 KB
english, 2007