SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - A study of overlay mark robustness and enhanced alignment techniques for alignment improvement on metal layers of sub-100nm technology
Dubey, Kaushalia, Flagello, Donis G., Nakamura, Toru, Tanaka, Hiroshi, Hayashi, Nozomu, Egashira, Shinichi, Mishima, Kazuhiko, Mase, Tomohiro, Takeuchi, Tamio, Honda, Akihiko, Kakizaki, TakatoshiVolume:
6520
Year:
2007
Language:
english
DOI:
10.1117/12.711324
File:
PDF, 639 KB
english, 2007