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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Optical Microlithography XX - Impact of illumination performance on hyper-NA imaging for 45-nm node
Mori, Ken-Ichiro, Flagello, Donis G., Yamada, Akihiro, Shiozawa, Takahisa, Takahashi, KazuhiroVolume:
6520
Year:
2007
Language:
english
DOI:
10.1117/12.711862
File:
PDF, 777 KB
english, 2007