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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Emerging Lithographic Technologies XI - Recent progress of a character projection-type low-energy electron-beam direct writing system
Noguchi, Kouhei, Lercel, Michael J., Watanabe, Katsuhide, Kinoshita, Hidetoshi, Shinozaki, Hiroyuki, Kojima, Yasushi, Morita, Satoshi, Nakamura, Fumihiko, Yamaguchi, Norihiro, Kushitani, Kazuhiko, NakVolume:
6517
Year:
2007
Language:
english
DOI:
10.1117/12.712118
File:
PDF, 570 KB
english, 2007