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SPIE Proceedings [SPIE Advanced Lithography - San Jose, CA (Sunday 25 February 2007)] Advances in Resist Materials and Processing Technology XXIV - Identifying materials limits of chemically amplified photoresists
Wu, Wen-li, Lin, Qinghuang, Prabhu, Vivek M., Lin, Eric K.Volume:
6519
Year:
2007
Language:
english
DOI:
10.1117/12.720424
File:
PDF, 411 KB
english, 2007