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SPIE Proceedings [SPIE Photomask and Next-Generation Lithography Mask Technology XIV - Yokohama, Japan (Tuesday 17 April 2007)] Photomask and Next-Generation Lithography Mask Technology XIV - Polarized transmittance-reflectance scatterometry measurements of 2D trench dimensions on phase-shift masks
Lam, John C., Watanabe, Hidehiro, Gray, Alexander, Howell, Rafael, Chen, StanleyVolume:
6607
Year:
2007
Language:
english
DOI:
10.1117/12.728949
File:
PDF, 1.04 MB
english, 2007