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SPIE Proceedings [SPIE 27th Annual BACUS Symposium on Photomask Technology - Monterey, CA (Monday 17 September 2007)] Photomask Technology 2007 - Mask CD control (CDC) with ultrafast laser for improving mask CDU using AIMS as the CD metrology data source
Ben-Zvi, Guy, Naber, Robert J., Kawahira, Hiroichi, Zait, Eitan, Dmitriev, Vladimir, Graitzer, Erez, Gottlieb, Gidi, Leibovich, Lior, Birkner, Robert, Boehm, Klaus, Scheruebl, ThomasVolume:
6730
Year:
2007
Language:
english
DOI:
10.1117/12.771190
File:
PDF, 601 KB
english, 2007