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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - CD uniformity control via real-time control of photoresist properties
Chen, Ming, Allgair, John A., Raymond, Christopher J., Fu, Jun, Ho, Weng Khuen, Tay, ArthurVolume:
6922
Year:
2008
Language:
english
DOI:
10.1117/12.771418
File:
PDF, 223 KB
english, 2008