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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - MuGFET observation and CD measurement by using CD-SEM
Maeda, Tatsuya, Allgair, John A., Raymond, Christopher J., Tanaka, Maki, Isawa, Miki, Watanabe, Kenji, Hasegawa, Norio, Sekiguchi, Kohei, Rooyackers, Rita, Collaert, Nadine, Vandeweyer, TomVolume:
6922
Year:
2008
Language:
english
DOI:
10.1117/12.771861
File:
PDF, 865 KB
english, 2008