![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 24 February 2008)] Metrology, Inspection, and Process Control for Microlithography XXII - Characterization of 32nm node BEOL grating structures using scatterometry
Zangooie, Shahin, Allgair, John A., Raymond, Christopher J., Sendelbach, Matthew, Angyal, Matthew, Archie, Charles, Vaid, Alok, Matthew, Itty, Herrera, PedroVolume:
6922
Year:
2008
Language:
english
DOI:
10.1117/12.773088
File:
PDF, 416 KB
english, 2008