SPIE Proceedings [SPIE Photomask and NGL Mask Technology XV - Yokohama, Japan (Wednesday 16 April 2008)] Photomask and Next-Generation Lithography Mask Technology XV - Printability impact of progressive defects: ammonium sulfate emulation study
Grenon, Brian, Horiuchi, Toshiyuki, Huang, Tracy, Dayal, Aditya, Bhattacharyya, KaustuveVolume:
7028
Year:
2008
Language:
english
DOI:
10.1117/12.793048
File:
PDF, 486 KB
english, 2008