SPIE Proceedings [SPIE NanoScience + Engineering - San Diego, California, USA (Sunday 10 August 2008)] Instrumentation, Metrology, and Standards for Nanomanufacturing II - Measurement of optical near field of a nanoscale aperture
Guo, Rui, Postek, Michael T., Allgair, John A., Huang, Wenhao, Kinzel, Edward C., Raman, Arvind, Xu, XianfanVolume:
7042
Year:
2008
Language:
english
DOI:
10.1117/12.796765
File:
PDF, 634 KB
english, 2008