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SPIE Proceedings [SPIE SPIE Lithography Asia - Taiwan - Taipei, Taiwan (Tuesday 4 November 2008)] Lithography Asia 2008 - High Si content BARC for applications in dual BARC systems such as tri-layer patterning
Kennedy, Joseph, Chen, Alek C., Lin, Burn, Xie, Song-Yuan, Wu, Ze-Yu, Yen, Anthony, Katsanes, Ron, Flanigan, Kyle, Lee, Kevin, Slezak, Mark, Fender, Nicolette, Takahashi, JunichiVolume:
7140
Year:
2008
Language:
english
DOI:
10.1117/12.804699
File:
PDF, 544 KB
english, 2008