![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Metrology, Inspection, and Process Control for Microlithography XXIII - Outliers detection by fuzzy classification method for model building
Top, Mame Kouna, Allgair, John A., Raymond, Christopher J., Trouiller, Yorick, Farys, Vincent, Fuard, David, Yesilada, Emek, Martinelli, Catherine, Said, Mazen, Foussadier, Franck, Schiavone, PatrickVolume:
7272
Year:
2009
Language:
english
DOI:
10.1117/12.812955
File:
PDF, 490 KB
english, 2009