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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - High-order distortion effects induced by extreme off-axis illuminations at hyper NA lithography
Rigolli, Pierluigi, Levinson, Harry J., Dusa, Mircea V., Capetti, Gianfranco, De Chiara, Elio, Amato, Leonardo, Iessi, Umberto, Canestrari, Paolo, Llorens, Christine, Smit, Sanne, Brige, Lionel, PlautVolume:
7274
Year:
2009
Language:
english
DOI:
10.1117/12.814148
File:
PDF, 450 KB
english, 2009