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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Optical Microlithography XXII - A novel methodology for hybrid mask AF generation for 22 and 15nm technology
Zou, Yi, Levinson, Harry J., Dusa, Mircea V., Capodieci, Luigi, Tabery, CyrusVolume:
7274
Year:
2009
Language:
english
DOI:
10.1117/12.814336
File:
PDF, 1.38 MB
english, 2009