SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Sub-20 nm trench patterning with a hybrid chemical shrink and SAFIER process
Chen, Yijian, Henderson, Clifford L., Xu, Xumou, Chen, Hao, Miao, Liyan, Blanco, Pokhui, Cai, Man-Ping, Ngai, Chris S.Volume:
7273
Year:
2009
Language:
english
DOI:
10.1117/12.814382
File:
PDF, 6.02 MB
english, 2009