SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Advances in Resist Materials and Processing Technology XXVI - Reflection control for immersion lithography: a single organic antireflectant over high-reflective substrates for double patterning
Wong, Sabrina, Henderson, Clifford L., Yu, Jeong Yun, Kim, Sue Ryeon, Mori, Mike, Kwok, Amy, O'Connell, Kathleen M., Barclay, George, Lee, Ki Lyoung, Lee, Sung Koo, Bok, Cheol KyuVolume:
7273
Year:
2009
Language:
english
DOI:
10.1117/12.816448
File:
PDF, 2.45 MB
english, 2009