SPIE Proceedings [SPIE SPIE Lithography Asia - Taipei, Taiwan (Wednesday 18 November 2009)] Lithography Asia 2009 - Source mask optimization (SMO) at full chip scale using inverse lithography technology (ILT) based on level set methods
Pang, Linyong, Chen, Alek C., Han, Woo-Sung, Hu, Peter, Peng, Danping, Lin, Burn J., Yen, Anthony, Chen, Dongxue, Cecil, Tom, He, Lin, Xiao, Guangming, Tolani, Vikram, Dam, Thuc, Baik, Ki-Ho, Gleason,Volume:
7520
Year:
2009
Language:
english
DOI:
10.1117/12.843578
File:
PDF, 14.80 MB
english, 2009