SPIE Proceedings [SPIE SPIE Advanced Lithography - San...

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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - Impact of scanner signatures on optical proximity correction

Tyminski, Jacek K., Dusa, Mircea V., Conley, Will, Matsuyama, Tomoyuki, Lu, Yen-Liang, Lai, Jun-Cheng, Chen, Kao-Tun, Mai, Yung-Ching, Su, Irene, Bailey, George
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Volume:
7640
Year:
2010
Language:
english
DOI:
10.1117/12.845061
File:
PDF, 982 KB
english, 2010
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