SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Extreme Ultraviolet (EUV) Lithography - Process liability evaluation for beyond 22nm node using EUVL
La Fontaine, Bruno M., Tawarayama, Kazuo, Aoyama, Hajime, Matsunaga, Kentaro, Arisawa, Yukiyasu, Uno, Taiga, Magoshi, Shunko, Kyoh, Suigen, Nakajima, Yumi, Inanami, Ryoichi, Tanaka, Satoshi, Kobiki, AVolume:
7636
Year:
2010
Language:
english
DOI:
10.1117/12.846265
File:
PDF, 2.42 MB
english, 2010