SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Optical Microlithography XXIII - A simplified reaction-diffusion system of chemically amplified resist process modeling for OPC
Fan, Yongfa, Dusa, Mircea V., Conley, Will, Jeongb, Moon-Gyu, Ser, Junghoon, Lee, Sung-Woo, Suh, Chunsuk, Koo, Kyo-Il, Lee, Sooryong, Su, Irene, Zavyalova, Lena, Falch, Brad, Huang, Jason, Schmoeller,Volume:
7640
Year:
2010
Language:
english
DOI:
10.1117/12.846737
File:
PDF, 2.92 MB
english, 2010