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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Design for Manufacturability through Design-Process Integration IV - The role of strong phase shift masks in Intel's DFM infrastructure development
Schenker, Richard, Rieger, Michael L., Thiele, Joerg, Singh, Vivek, Borodovsky, YanVolume:
7641
Year:
2010
Language:
english
DOI:
10.1117/12.849022
File:
PDF, 3.12 MB
english, 2010