SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Improvement of mask write time for curvilinear assist features at 22nm
Fujimura, Aki, Montgomery, M. Warren, Maurer, Wilhelm, Bork, Ingo, Kiuchi, Taiichi, Komagata, Tadashi, Nakagawa, Yasutoshi, Hagiwara, Kazuyuki, Hara, DaisukeVolume:
7823
Year:
2010
Language:
english
DOI:
10.1117/12.864094
File:
PDF, 1.46 MB
english, 2010