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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - EUV mask defect mitigation through pattern placement
Burns, John, Montgomery, M. Warren, Maurer, Wilhelm, Abbas, MansoorVolume:
7823
Year:
2010
Language:
english
DOI:
10.1117/12.865160
File:
PDF, 347 KB
english, 2010