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SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Feasibility study of EUV patterned mask inspection for the 22nm node
Bernstein, Dana, Montgomery, M. Warren, Maurer, Wilhelm, Park, Eun Young, Jaffe, Asaf, Shoshani, Nir, Parizat, Ziv, Mangan, Shmoolik, Han, Sang Hoon, Chung, Dong HoonVolume:
7823
Year:
2010
Language:
english
DOI:
10.1117/12.866155
File:
PDF, 1.81 MB
english, 2010