SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - CD correction for half pitch 2x-nm on extreme ultraviolet lithography
Aoyama, Hajime, La Fontaine, Bruno M., Naulleau, Patrick P., Tanaka, Yuusuke, Tawarayama, Kazuo, Arisawa, Yukiyasu, Uno, Taiga, Kamo, Takashi, Tanaka, Toshihiko, Myers, Alan, Shroff, Yashesh, Murachi,Volume:
7969
Year:
2011
Language:
english
DOI:
10.1117/12.878672
File:
PDF, 7.25 MB
english, 2011