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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - LWR improvement in EUV resist process
Koh, Chawon, La Fontaine, Bruno M., Naulleau, Patrick P., Kim, Hyun-Woo, Kim, Sumin, Na, Hai-Sub, Park, Chang-Min, Park, Cheolhong, Cho, Kyoung-YongVolume:
7969
Year:
2011
Language:
english
DOI:
10.1117/12.879334
File:
PDF, 1.31 MB
english, 2011