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SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 27 February 2011)] Extreme Ultraviolet (EUV) Lithography II - Compensation for EUV multilayer defects within arbitrary layouts by absorber pattern modification
Pang, Linyong Leo, La Fontaine, Bruno M., Naulleau, Patrick P., Clifford, Chris, Hu, Peter, Peng, Danping, Li, Ying, Chen, Dongxue, Satake, Masaki, Tolani, Vikram, He, LinVolume:
7969
Year:
2011
Language:
english
DOI:
10.1117/12.879556
File:
PDF, 7.72 MB
english, 2011