SPIE Proceedings [SPIE 27th European Mask and Lithography Conference - Dresden, Germany (Tuesday 18 January 2011)] 27th European Mask and Lithography Conference - Imaging performance improvements by EUV mask stack optimization
Davydova, Natalia, Behringer, Uwe F.W., van Setten, Eelco, de Kruif, Robert, Oorschot, Dorothe, Dusa, Mircea, Wagner, Christian, Jiang, Jiong, Liu, Wei, Kang, Hoyoung, Liu, Hua-yu, Spies, Petra, WieseVolume:
7985
Year:
2011
Language:
english
DOI:
10.1117/12.884504
File:
PDF, 635 KB
english, 2011