![](/img/cover-not-exists.png)
SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 12 February 2012)] Alternative Lithographic Technologies IV - Modeling line-edge roughness in lamellar block copolymer systems
Patrone, Paul N., Gallatin, Gregg M., Tong, William M.Volume:
8323
Year:
2012
Language:
english
DOI:
10.1117/12.918038
File:
PDF, 409 KB
english, 2012