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SPIE Proceedings [SPIE 1983 Microlithography Conferences - Santa Clara (Monday 14 March 1983)] Electron-Beam, X-Ray and Ion-Beam Techniques for Submicron Lithographies II - Submicron Electron Beam And Optical Lithography Using A Tri-Level Resist Scheme
Buiguez, F, Parrens, P., Picard, B., Blais, Phillip D.Volume:
393
Year:
1983
Language:
english
DOI:
10.1117/12.935110
File:
PDF, 7.46 MB
english, 1983